SiC Substrate

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Faqs:

1. What is a SiC substrate, and why is it important in semiconductor applications?

A SiC (Silicon Carbide) substrate is a single – crystal wafer made of silicon carbide. It’s crucial in semiconductors because of its wide bandgap, high thermal conductivity, and high breakdown electric field. These properties enable the development of high – power, high – frequency, and high – temperature electronic devices, outperforming traditional silicon in many harsh – environment and high – performance applications.

SiC has several polytypes, with 4H – SiC and 6H – SiC being the most common for substrates. 4H – SiC offers a good balance of high electron mobility and thermal properties, making it suitable for power devices. 6H – SiC has a more complex structure and is sometimes used in optoelectronic applications. The differences lie in their lattice constants, bandgaps, and electron transport characteristics, which impact device performance.

The main growth method is the physical vapor transport (PVT) method. Advantages include the ability to grow large – diameter (currently up to 6 – inch and beyond) and high – quality single crystals. Disadvantages are high growth temperatures (around 2000–2500 °C), slow growth rates, and the need for precise control of temperature gradients and gas flow. Other methods like chemical vapor deposition (CVD) are used for epitaxial layers but not yet as mature for bulk substrate growth.

Yes. For example, GaN (Gallium Nitride) can be epitaxially grown on SiC substrates. The lattice mismatch between SiC and GaN is relatively small, allowing for the fabrication of heterostructure devices. This combination leverages SiC’s high thermal conductivity and GaN’s high electron mobility for high – power and high – frequency applications like RF amplifiers.

SiC substrates are significantly more expensive than silicon substrates. Factors include the high cost of raw materials, the complex and slow growth process (PVT requires high temperatures and specialized equipment), and lower yields during crystal growth and wafer processing. However, as technology matures and production scales up, costs are gradually decreasing.

Commercially, SiC substrates are available in diameters ranging from 2 inches to 6 inches (and development is ongoing for larger sizes). Thicknesses can vary, but for typical device fabrication, wafer thicknesses are in the range of several hundred micrometers. The thickness is related to mechanical stability during processing and device operation, especially for high – power applications where heat dissipation is critical.

In EVs, SiC substrates are used to fabricate power devices (such as MOSFETs and diodes) in the traction inverter. These devices can operate at higher temperatures and voltages, enabling more efficient power conversion, reduced energy loss, and smaller, lighter inverter systems. This contributes to increased driving range and improved overall performance of electric vehicles.

Characterization techniques include X – ray diffraction (XRD) for crystal structure and orientation analysis, atomic force microscopy (AFM) for surface roughness measurement, optical microscopy and electron microscopy for defect inspection (identifying micropipes, dislocations), and electrical characterization methods (such as Hall effect measurements) to determine carrier concentration and mobility. These techniques ensure that the substrates meet the strict quality requirements for device fabrication.

Source from suppliers or grow in-house by aligning seed crystals with precision fixtures; verify via X-ray diffraction.

Use in-situ optical interference monitoring, regulate source material via mass-flow controllers, or fine-tune with post-growth thinning.

Fabricate ultra-thin layers, combine with flexible polymers via CVD, or use nano/micro-structuring to relieve stress.

Use recycled/lower-grade substrates (with treatment), optimize growth yield, or collaborate to share costs.

Use MD for atomic processes, FEA for thermal/mechanical modeling, CFD for gas flow, or specialized semiconductor growth software.