Fused Silica Wafer
Fused Silica Wafers are essential substrates for advanced semiconductor research and precision applications. With exceptional thermal stability, ultra-low thermal expansion, and excellent optical transparency, they provide a reliable platform for microelectronics, photonics, and MEMS development. Their superior purity ensures minimal contamination, making them ideal for high-accuracy experiments in university laboratories and R&D facilities. Whether used for optical devices, microfabrication, or high-temperature processes, our fused silica wafers deliver consistent performance and support the innovation needs of global semiconductor professionals and academic researchers.
- High Purity, Contamination-Free Material
- Reliable Substrate for High-Temperature Processes
- Widely Used in Academia and Semiconductor R&D
- Custom Sizes and Surface Finishes Available
Fused Silica Wafer Supplier - Supwafer
Faqs:
1. What is a fused silica wafer and why is it important in semiconductor research?
A fused silica wafer is a high-purity quartz substrate valued for its thermal stability, low expansion, and excellent optical transparency. It is widely used in semiconductor research, MEMS development, photonics, and university laboratory experiments.
2. How does a fused silica wafer differ from standard quartz wafers?
Compared to natural quartz wafers, fused silica wafers offer higher purity, lower thermal expansion, and superior UV transmission, making them a preferred choice for advanced semiconductor and photonics applications.
3. What are the typical thickness options available for fused silica wafers?
Fused silica wafers are available in thicknesses ranging from 200 μm to 2 mm, with customized thicknesses provided for academic research and semiconductor R&D projects.
4. What wafer diameters are standard for fused silica substrates?
Common diameters include 2-inch, 4-inch, 6-inch, and 8-inch fused silica wafers, though custom sizes can be manufactured to meet the needs of university laboratories and industrial users.
5. Can fused silica wafers withstand high-temperature semiconductor processes?
Yes. Fused silica wafers have excellent thermal resistance up to 1000°C, ensuring reliable performance during high-temperature semiconductor fabrication, microfabrication, and optical device testing.
6. Do fused silica wafers provide UV and optical transparency?
Yes. Fused silica wafers feature outstanding UV, visible, and IR transmission, making them ideal for optical research, photonics, lithography, and academic experiments.
7. What are the main applications of fused silica wafers in research and industry?
Fused silica wafers are commonly used for MEMS fabrication, photomasks, semiconductor device prototyping, photonics, and optical sensors. Their high purity and stability make them especially valuable in university R&D labs.
8. Are fused silica wafers suitable for cleanroom semiconductor processing?
Yes. Fused silica wafers are ideal for cleanroom environments because of their high purity, low particle generation, and contamination-free properties, making them widely used in semiconductor manufacturing and university research labs.
9. Can fused silica wafers be used for MEMS fabrication?
Absolutely. Fused silica wafers are a preferred substrate for MEMS fabrication due to their dimensional stability, low thermal expansion, and excellent optical transparency, enabling reliable micro-scale device development.
10. What polishing options are available for fused silica wafers?
Fused silica wafers can be supplied single-side polished (SSP), double-side polished (DSP), or unpolished, depending on research and industrial applications. Polished wafers ensure high surface quality for photonics, optics, and lithography research.
11. How should fused silica wafers be stored in research laboratories?
They should be stored in protective wafer carriers within a clean, dry, and temperature-controlled environment to maintain purity and prevent scratches or contamination — essential for academic and R&D use.
12. Are fused silica wafers resistant to chemicals?
Yes, fused silica offers excellent chemical resistance, making it suitable for semiconductor etching and cleaning processes. The only exception is hydrofluoric acid (HF), which can etch silica substrates.
13. What advantages do fused silica wafers provide in academic research?
For universities and research institutes, fused silica wafers deliver high-precision optical clarity, low expansion rates, and superior stability, making them valuable in nanotechnology, photonics, and semiconductor device research.
14. How are fused silica wafers packaged for international shipping?
To ensure safe delivery, wafers are packed in anti-static wafer carriers with shock-absorbing materials, meeting the requirements of global semiconductor companies and university labs.
15. Where can fused silica wafers be sourced for university laboratories and R&D centers?
High-quality fused silica wafers can be sourced from specialized semiconductor material suppliers that serve both industrial manufacturers and academic research institutions worldwide, ensuring consistent quality and reliable performance.
16. Can fused silica wafers be customized for university research or industrial applications?
Yes. We provide custom fused silica wafers with tailored diameters, thicknesses, surface finishes, and flatness levels, designed to meet the specific requirements of university laboratories, MEMS projects, and semiconductor R&D applications.
17. What customization options are available for fused silica wafers?
Customization includes wafer diameter, thickness, edge profile, surface polishing (single-side or double-side), and optical coatings. These options ensure the wafers meet the unique needs of academic research experiments, photonics development, and high-precision semiconductor processes.