Porous Ceramic Vacuum Chucks are advanced, high-performance workholding solutions designed for precision applications, especially in semiconductor manufacturing, microelectronics, and nanotechnology research. Crafted from specialized ceramic materials, these chucks feature a unique microporous structure that enables uniform and stable vacuum suction, ensuring secure holding of delicate workpieces such as semiconductor wafers, thin films, and microelectromechanical systems (MEMS) devices without causing any damage or deformation. These chucks stand out for their exceptional chemical resistance, allowing them to withstand exposure to a wide range of aggressive chemicals commonly used in semiconductor processing. They also offer outstanding high-temperature stability, maintaining reliable performance even in environments reaching up to 800°C, which is crucial for processes like high-temperature annealing and epitaxial growth. With anti-static properties, they effectively prevent electrostatic discharge (ESD) damage to sensitive components. Additionally, their low-contamination nature makes them suitable for cleanroom environments, minimizing the risk of particle or chemical contamination.

Porous Ceramic Vacuum Chucks are highly customizable, with adjustable parameters like pore density and chuck size to meet specific application requirements. Their high mechanical strength and long service life ensure durability and cost-effectiveness, reducing the need for frequent replacements. Whether for academic research in university labs or high-volume industrial production, these chucks provide a reliable, efficient, and precision-engineered solution for workpiece holding.