High Resistivity Silicon Wafer (FZ)

100–100k Ω·cm for RF & MEMS | Custom Supplier

High resistivity silicon wafers (HRSWs) are single-crystal float-zone (FZ) silicon substrates engineered to minimize free carriers and parasitic leakage. With typical resistivity ranges from ≥100 Ω·cm up to 100,000+ Ω·cm, these wafers deliver superior signal integrity for RF/microwave systems, higher breakdown performance for power devices, and ultra-low noise for quantum and sensing applications. Supwafer provides configurable FZ high resistivity silicon wafers, CoA (Certificate of Analysis), and engineering support to help you select the exact wafer grade for your device needs.

Table of Contents

What Is a High Resistivity Silicon Wafer?

High resistivity silicon wafers are engineered substrates with resistivity typically above 1,000 Ω·cm, designed to minimize parasitic conduction and RF signal loss in high-frequency applications.

They are commonly produced using Float Zone (FZ) crystal growth, which avoids oxygen contamination found in standard CZ silicon, enabling ultra-high purity and stable electrical performance. By reducing free carriers (electrons and holes), these wafers significantly lower dielectric loss and substrate interference.

As a result, high resistivity silicon wafers are widely used in RF devices, MEMS sensors, advanced packaging, and other applications requiring high signal integrity and low noise performance.

Why Float Zone (FZ) Matters?

    • FZ process eliminates contact with a quartz crucible, dramatically reducing oxygen contamination that would limit resistivity.

    • CZ wafers are common for standard electronics but typically limited to <50 Ω·cm; for true high resistivity (≥100 Ω·cm) applications, FZ is the industry standard.

    • If your design needs low dielectric loss or ultra-low charge noise, insist on FZ high resistivity wafers and CoA verification.

High Resistivity Silicon Wafer

Technical Specifications (Typical / Available)

Note: Supwafer offers standard specs below; tighter tolerances or custom grades available on request.

Parameter Typical Range / Option Notes
Resistivity 100 – 10,000+ Ω·cm N-type or P-type; ultra-high resistivity tiers on request
Wafer diameter 100 mm, 150 mm, 200 mm (custom up to 300 mm) Round or square sections available
Thickness 380–775 μm (typical by diameter); custom 100–1500 μm Thickness tolerance ±5–25 μm depending on spec
Surface finish DSP (double-side polished), SSP (single-side polished) DSP Ra <1 nm typical
TTV (Total thickness variation) ≤5–10 μm typical Tight TTV available for high precision needs
Warp / Bow ≤25 μm typical Controls automated handling & lithography yield
Resistivity uniformity ±5–10% across wafer Critical for RF and power device uniformity
Crystal orientation <100> (common) / <111> available <100> preferred for most RF and CMOS process compatibility
high resistivity wafer supplier

Wafer Types & Grades

By Resistivity Tier:

    • Standard high resistivity: 100–5,000 Ω·cm — broad use in RF and power sensors.

    • Ultra-high resistivity: >5,000 Ω·cm — specialized for quantum computing qubits and ultra-low noise sensors.

By Doping:

    • N-type FZ HRSW — phosphorus/arsenic doped; often used in low-noise RF and space applications.

    • P-type FZ HRSW — boron doped; preferred in some high-voltage power applications and radiation-tolerant designs.

High Resistivity Silicon Wafer Primary Applications

Our high resistivity silicon wafers are widely used in advanced semiconductor and research applications where low loss, high isolation, and stable electrical performance are critical:

RF & Microwave Devices

    • Low dielectric loss and minimal substrate leakage for SAW/BAW filters, RF switches, and high-frequency modules (5G/6G).

Power Electronics

    • higher breakdown voltages and lower leakage for IGBTs, Schottky diodes, and EV inverters.

MEMS & Sensors

    • Ideal substrates for microfabricated sensors where electrical isolation and substrate control are essential.

Advanced Packaging & Interposers

    • Used in silicon interposers and heterogeneous integration for high-density signal routing.

Photonics & Optical Integration

    • Supports low-loss signal transmission in photonic and optoelectronic devices.

Quantum Computing & Research

    • Ultra-high resistivity minimizes charge noise and improves device stability in quantum and low-noise environments.

How to Select the High Resistivity Silicon Wafer?

    • Define Resistivity Target — map device needs to resistivity range (e.g., RF: 500–2,000 Ω·cm; Power: 100–500 Ω·cm; Quantum: >5,000 Ω·cm).

    • Confirm Growth Method — require Float Zone (FZ) on datasheet/CoA.

    • Check Uniformity & Tolerances — request TTV, warp/bow, and resistivity uniformity specs.

    • Verify Material Certification — ask for CoA, four-point probe maps, and supplier test reports (SIMS, FTIR if OH content critical).

Partner with a Reliable Supplier — Choosing a trusted manufacturer is as important as defining technical specs. Supwafer specializes in high-purity Float Zone production and delivers High Resistivity Silicon Wafers with tight uniformity, full CoA documentation, and customizable diameters and orientations. By sourcing directly from Supwafer, you can quickly obtain technical support and competitive pricing while ensuring your wafers meet the exact resistivity target for RF, power or quantum applications.

Customization Options

  We support full customization:

      • Resistivity range (1k–10k Ω·cm or higher)
      • Wafer size & thickness
      • Orientation & doping type
      • Surface finish (SSP / DSP)
      • Special coatings (SiO₂, Si₃N₄, etc.)

Why Choose Us?

Precision Resistivity Control

We ensure stable resistivity across the wafer, reducing variation and improving device consistency.

Clean Surface & Low Defect Density

Strict polishing and inspection processes minimize particles, micro-cracks, and contamination risks.

Flexible Customization

From diameter and thickness to doping and orientation — fully tailored to your project needs.

Fast Response & Engineering Support

Our team supports both R&D and industrial customers with fast quotes and technical guidance.

Faqs:

1. What is High Resistivity Silicon?

High Resistivity Silicon Wafer refers to silicon material with a resistivity typically ≥ 100 Ω·cm and up to several kΩ·cm. It is produced mainly by the Float Zone (FZ) process to achieve extremely low impurity and defect levels. Such wafers are ideal for RF, microwave, detector and sensor applications where low dielectric loss is critical.

Standard silicon wafers for CMOS or power devices usually range from 0.001 Ω·cm to 10 Ω·cm depending on doping. A High Resistivity Silicon Wafer starts from 100 Ω·cm and can reach several thousand Ω·cm, offering very low free-carrier concentration.

These numbers denote crystal orientations. (100) wafers are most common in CMOS fabrication; (111) wafers offer better thermal stability and are often used for MEMS or epitaxial growth; (110) wafers are chosen for high-mobility devices and specific etching properties.

Intrinsic silicon at room temperature has about 2.3 kΩ·cm. By doping, the resistivity can be tailored from 0.001 Ω·cm up to several kΩ·cm. High Resistivity Silicon Wafers manufactured by the FZ method provide the upper end of this range.

Among common semiconductors, semi-insulating SiC or GaAs can reach 10⁷–10⁹ Ω·cm. Within the silicon family, Float-Zone High Resistivity Silicon Wafers (≥10 kΩ·cm) are among the highest.

High resistivity arises from extremely low dopant and defect concentrations. The Float-Zone process avoids contact with quartz crucibles and minimizes oxygen, leading to very low free-carrier density and high resistivity.

Low carrier concentration, compensation doping, crystal purity, and wide band gap all contribute. High Resistivity Silicon Wafers combine these factors to achieve stable resistivity and low dielectric loss.

The standard unit is ohm-centimeter (Ω·cm), defined by ASTM and SEMI specifications. For thin films, sheet resistance may also be expressed in Ω/sq, but bulk wafer resistivity uses Ω·cm.

Standard lead time for custom wafers is 4 – 6 weeks. Urgent orders can be expedited within 2 – 3 weeks for an additional fee.

Dopant type and concentration, temperature, defects, crystal orientation, and bandgap determine resistivity. In High Resistivity Silicon Wafers, controlling oxygen and carbon levels is also essential.

Our wafers are stored in nitrogen-filled chambers to prevent oxidation. Shelf life exceeds 12 months under recommended conditions.

Our technical team provides 24/7 support, including on-site assistance for complex research projects.

Yes, our wafers maintain resistivity stability down to 4K, making them ideal for quantum computing and low-temperature electronics research.

We offer sample wafers at reduced cost. Contact us with your project details to request samples.

Dopant type and concentration, temperature, defects, crystal orientation, and bandgap determine resistivity. In High Resistivity Silicon Wafers, controlling oxygen and carbon levels is also essential.

All materials show resistivity changes with impurity levels, temperature, and structural defects. High purity Float-Zone silicon maintains its specified resistivity more consistently.

Resistance (R) is a property of a specific piece with length and cross-section, while resistivity (ρ) is an intrinsic material property. They are related by R=ρ L/AR = \rho \, L / A.

Yes. In metals, resistivity increases with temperature; in semiconductors and insulators, resistivity typically decreases as temperature rises because more carriers are thermally excited. High Resistivity Silicon Wafers exhibit this temperature dependence as well.

High resistivity reduces substrate losses and improves signal integrity, making it ideal for high-frequency circuits.

FZ wafers offer higher purity and resistivity, while CZ wafers are more cost-effective and widely used.

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